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Title:
ALIGNING MECHANISM AND WAFER CONVEYING HAND
Document Type and Number:
Japanese Patent JP2005191464
Kind Code:
A
Abstract:

To provide an aligning mechanism which executes a positioning in a rotating direction of a wafer without applying damage to the wafer, and also to provide a wafer conveying hand finishing the positioning in the rotating direction while conveying.

After a wafer W is caught by a wafer conveying hand 10 in such a way of swirling flow generated by an air discharged from an air discharge opening 12, the movement of the wafer W in the planar direction of the wafer W is regulated by transferring a slider 13 in the guiding direction of an arrow a1. At that moment, from a rotating rotor 14 to the wafer W, only a slight thrusting force is required to rotate the wafer W.


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Inventors:
IWASAKA HITOSHI
TOKUNAGA HIDEYUKI
KOBAYASHI KOTARO
YOKOO TOMOFUMI
Application Number:
JP2003434076A
Publication Date:
July 14, 2005
Filing Date:
December 26, 2003
Export Citation:
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Assignee:
HARMOTEC CORP
International Classes:
B25J15/06; B25J15/08; B65G49/07; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B25J15/06; B25J15/08; B65G49/07
Attorney, Agent or Firm:
川▲崎▼ 研二



 
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