To provide a chemical mechanical polishing method that prevents oxidation, corrosion, or other trouble from occurring to a sample having been polished.

A pedestal pad (sample table pad) 125 is arranged on a pedestal (sample table) where a wafer (sample) before or after polishing is temporarily mounted. The pedestal pad 125 is formed of resin, and at least a surface which comes into contact with the wafer absorbs no liquid, has fine and smooth texture, and does not have gaps such as pores wherein liquid is held.