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Title:
EXPOSURE METHOD, METHOD OF MANUFACTURING DEVICE, AND SUBSTRATE
Document Type and Number:
Japanese Patent JP2010219555
Kind Code:
A
Abstract:

To provide an exposure method properly performing exposure processing while maintaining a liquid in a desired state.

In this exposure method for arranging a liquid LQ on a substrate P and irradiating the substrate P with an exposure light through the liquid LQ to expose the substrate P thereto, the concentration of an eluted substance in the liquid LQ arranged on the substrate P is set to satisfy a condition of RW-RP≤1.0×10-3, wherein RP is a transmittance per mm, in the optical path direction of the exposure light, of the liquid LQ containing the eluted substance eluted from the substrate P after the liquid LQ is arranged on the substrate P, and Rw is transmittance of the liquid LQ per mm in the optical path direction of the exposure light before the eluted substance is eluted.


Inventors:
NAKANO KATSUSHI
Application Number:
JP2010130431A
Publication Date:
September 30, 2010
Filing Date:
June 07, 2010
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027
Domestic Patent References:
JP2006030603A2006-02-02
JP2005316352A2005-11-10
JP2005264131A2005-09-29
JP2006005335A2006-01-05
JP2005353763A2005-12-22
JP2005294520A2005-10-20
JP2005277053A2005-10-06
Foreign References:
WO2004019128A22004-03-04
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi



 
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