Title:
基板処理装置の洗浄装置および洗浄方法
Document Type and Number:
Japanese Patent JP7038524
Kind Code:
B2
Abstract:
A cleaning apparatus of a substrate processing apparatus according to an exemplary embodiment includes a nozzle and a scanner. The nozzle ejects a gas toward in an inner wall surface of a processing chamber in which a substrate is processed. The scanner causes the nozzle to scan along the inner wall surface of the processing chamber in the processing chamber.
More Like This:
Inventors:
Kohei Yamada
Hiroro Inatomi
Satoshi Loquat
Hiroro Inatomi
Satoshi Loquat
Application Number:
JP2017218700A
Publication Date:
March 18, 2022
Filing Date:
November 14, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304; F26B5/00
Domestic Patent References:
| JP62258740A | ||||
| JP2013012538A |
Attorney, Agent or Firm:
Sakai International Patent Office
Previous Patent: Rotating light beam generator
Next Patent: Learning methods, programs and learning terminals
Next Patent: Learning methods, programs and learning terminals