Title:
還元剤生成装置の制御方法、排ガス浄化処理方法、還元剤生成システム及び排ガス浄化処理システム
Document Type and Number:
Japanese Patent JP7422895
Kind Code:
B2
Abstract:
A method for controlling a reductant generation device 100, the reductant generation device 100 including: a sprayer 10 capable of spraying a reductant precursor 50; and a heater 20 comprising a ceramic substrate 21, the heater 20 being arranged on a downstream side of the sprayer 10 and capable of heating the reductant precursor 50 to generate a reductant 60. The method includes: a permeation step of spraying the reductant precursor 50 from the sprayer 10 and permeating the ceramic substrate 21 with the reductant precursor 50 when the heater is not heated; and after the permeation step, a heating step A of heating the reductant precursor 50 by the heater 20 and generating the reductant 60 while spraying the reductant precursor 50 from the sprayer 10.
Inventors:
Katsumi Saiki
Yukinari Shibagaki
Yukinari Shibagaki
Application Number:
JP2022560637A
Publication Date:
January 26, 2024
Filing Date:
June 03, 2021
Export Citation:
Assignee:
Nippon Insulator Co., Ltd.
International Classes:
F01N3/24; B01D53/94; B01J35/50; B01J35/57; B01J38/00; F01N3/08; F01N3/28; F01N9/00
Domestic Patent References:
| JP2017180299A |
Foreign References:
| WO2014148506A1 | ||||
| US20200018207 |
Attorney, Agent or Firm:
Axis International Patent Attorney Corporation
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