DETERMINATION METHOD, EVALUATION METHOD, EXPOSURE METHOD, EVALUATION APPARATUS, LIQUID-IMMERSION EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Japanese Patent JP2008205460

A

To provide a determination method which is capable of properly determining reference information for evaluating a film used for liquid-immersion exposure.

The determination method for determining reference information for evaluation of a first film for liquid-immersion exposure includes the steps of: moving a first liquid holding member and a substrate under a plurality of movement conditions with liquid held between the first liquid holding member used in a liquid-immersion exposure apparatus and the substrate on which a second film is formed; detecting a state of the liquid on the second film when moved them; relatively moving a second liquid holding member and a substrate under the plurality of movement conditions with liquid held between the second liquid holding member being different from the first liquid holding member and the substrate on which a second film is formed; detecting a state of the liquid held on the second film when moved them; and determining reference information on the basis of the relative movement conditions of the second liquid holding member and the substrate.

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JP4703354	Substrate with multi-layer reflective film, its manufacturing method, reflective mask blank and reflective mask

NAGASAKA HIROYUKI
FUJIWARA TOMOHARU

JP2008029710A

September 04, 2008

February 08, 2008

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NIKON CORP

H01L21/027; G03F7/20

Masatake Shiga
Tadashi Takahashi
Kazuya Nishi

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