To provide a double-face polishing device and method capable of efficiently polishing works in a short time and uniformizing their thickness in a plurality of works to be polished simultaneously.

An surface plate 11 is partially suspended by a plurality of flexible suspension members 211 so as to contact with a thicker work 16h at a higher pressure. This constitution can widen a high polishing speed from the thick work to the thin work in order with the polishing, thereby polishing the respective works 16 into mutually equal thickness.