露光装置及び物品の製造方法

Title:

露光装置及び物品の製造方法

Document Type and Number:

Japanese Patent JP7204400

Kind Code:

B2

Abstract:

To provide an exposure apparatus capable of varying the numerical aperture of a projection optical system by a simple configuration.SOLUTION: The exposure apparatus has a projection optical system for projecting a mask pattern onto a substrate, in which a first diaphragm defining a first aperture diameter and a second diaphragm defining a second aperture diameter smaller than the first aperture diameter are disposed on or near a curved pupil plane of the projection optical system.SELECTED DRAWING: Figure 6

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Inventors:

Takeshi Nakajima
Mitsuru Kuramoto
Atsushi Endo

Application Number:

JP2018184609A

Publication Date:

January 16, 2023

Filing Date:

September 28, 2018

Export Citation:

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Assignee:

Canon Inc

International Classes:

G03F7/20; G02B7/02; G03B9/02; G03B9/06

Domestic Patent References:

JP2009081304A
JP2003347193A
JP2007043168A
JP2002118053A
JP2018031873A
JP2003307763A
JP2002372735A
JP2001183716A

Foreign References:

WO2017047793A1

Attorney, Agent or Firm:

Takuma Abe
Sougo Kuroiwa

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