To provide an exposure control apparatus for exposing a shot of a wafer circumference with high yield and high efficiency.

The exposure control apparatus includes an exposure presence-setting unit 12 that performs an exposure setting of setting an exposure shot as a shot that is exposed or a shot that is not exposed based on height information on a height of the wafer in the exposure shot arranged in the after circumference, and an exposure instructing unit 14 that outputs an exposure instruction to the shot that is exposed and an instruction to skip an exposure to the shot that is not exposed by the exposure presence-setting unit 12.