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Title:
EXPOSURE DEVICE AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2016105189
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To accurately transfer a mask pattern on a substrate.SOLUTION: An exposure device comprises: a first encoder system which comprises plural heads (26A-26A, 26C-26C) for individually emitting beams to a reflective lattice part 24A, and measures a position of a stage RST; a second encoder system which comprises plural heads (such as 46B, 46C, 46D) for individually emitting beams to a stage WST for holding a wafer W, a detection system for detecting a mark on the wafer W, and reflective lattice parts (such as 44B, 44C, 44D), and measures a position of the stage WST; and a control system for, based on the measurement information from the first and second encoder systems, controlling driving of the stages RST, WST respectively. In a mark detection operation by the detection system, the positional information of the stage WST is measured by the second encoder system.SELECTED DRAWING: Figure 1

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Inventors:
SHIBAZAKI YUICHI
Application Number:
JP2016004015A
Publication Date:
June 09, 2016
Filing Date:
January 13, 2016
Export Citation:
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Assignee:
NIKON CORP
International Classes:
G03F7/20; G01B11/00; G01B11/26; H01L21/68
Domestic Patent References:
JPH07270122A1995-10-20
JP2005203483A2005-07-28
JP2003249443A2003-09-05
JPH10214783A1998-08-11
JPH10284409A1998-10-23
JPS61228309A1986-10-11
JP2003279385A2003-10-02
JPH04265805A1992-09-22
JPH05129184A1993-05-25
JP2002289515A2002-10-04
JPH07325623A1995-12-12
JPH11218941A1999-08-10
JPS63292005A1988-11-29
JP2002151405A2002-05-24
JP2004140290A2004-05-13
JP2003227735A2003-08-15
JP2005285881A2005-10-13
JP2005159322A2005-06-16
Foreign References:
WO1999049504A11999-09-30
US20050094125A12005-05-05
US20020085190A12002-07-04
US20020041380A12002-04-11
WO2000017724A12000-03-30
US5610715A1997-03-11
Attorney, Agent or Firm:
Atsushi Tateishi



 
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