EXPOSURE METHOD OF ELECTRON BEAM

Title:

EXPOSURE METHOD OF ELECTRON BEAM

Document Type and Number:

Japanese Patent JPS5414170

Kind Code:

A

Abstract:

PURPOSE:To enable to form fine pattern of 1mum or less, by exposing the part not requiring the accuracy comparatively among the patterns in advance and exposing the part requiring the precision after that.

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Inventors:

ITOU MASAKI
OONISHI YOSHITAKE
MIZUNO KENJI

Application Number:

JP8029777A

Publication Date:

February 02, 1979

Filing Date:

July 04, 1977

Export Citation:

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Assignee:

NIPPON ELECTRIC CO

International Classes:

H01L21/027; H01L21/302; (IPC1-7): H01L21/302

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