Title:
Ｆｅ－Ｐｔ－ＢＮ系スパッタリングターゲット及びその製造方法
Document Type and Number:
Japanese Patent JP7267425
Kind Code:
B2
Abstract:
A problem of particle generation in an Fe-Pt-BN-based sputtering target having a high relative density is resolved by an approach different from conventional methods.An Fe-Pt-BN-based sputtering target having a relative density of 90% or more and a Vickers hardness of 150 or less can reduce the number of particles generated during magnetron sputtering.
Inventors:
Masahiro Nishiura
Takamitsu Yamamoto
Kenta Kurose
Hironori Kobayashi
Takashi Miyashita
Takamitsu Yamamoto
Kenta Kurose
Hironori Kobayashi
Takashi Miyashita
Application Number:
JP2021532704A
Publication Date:
May 01, 2023
Filing Date:
May 22, 2020
Export Citation:
Assignee:
Tanaka Kikinzoku Kogyo Co., Ltd.
International Classes:
C22C1/05; C23C14/34; C22C1/10; C22C5/04; C22C30/00; C22C32/00
Domestic Patent References:
| JP2021008641A |
Foreign References:
| WO2014045744A1 | ||||
| WO2018047978A1 | ||||
| WO2014064995A1 | ||||
| WO2016047578A1 | ||||
| WO2016047236A1 | ||||
| WO2014132746A1 | ||||
| WO2019181823A1 |
Attorney, Agent or Firm:
Osamu Yamamoto
Toru Miyamae
Junichi Matsuo
Minako Matsuyama
Toru Miyamae
Junichi Matsuo
Minako Matsuyama