成膜システム及び基板上に膜を形成する方法

Japanese Patent JP6970624

B2

A film forming system comprises a chamber, a stage, a holder, a cathode magnet, a shield, a first moving mechanism, and a second moving mechanism. The chamber provides a processing space. The stage is provided in the processing space and configured to support a substrate. The holder is configured to hold a target that is provided in the processing space. The cathode magnet is provided outside the chamber with respect to the target. The shield has a slit and is configured to block particles released from the target around the slit. The first moving mechanism is configured to move the shield between the stage and the target along a scanning direction substantially parallel to a surface of the substrate mounted on the stage. The second moving mechanism is configured to move the cathode magnet along the scanning direction.

JP2702843	MAGNET STRUCTURE OF PLANAR TYPE MAGNETRON SPUTTERING SOURCE
JP5694183	Closed-drift magnetic field ion source device including self-cleaning anode and substrate modification process by the device
WO/2018/003615	SPUTTERING APPARATUS FILM FORMATION UNIT

Masato Shinada
Naoki Watanabe
Tetsuya Miyashita
Hiroaki Chihaya

JP2018022894A

November 24, 2021

February 13, 2018

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東京エレクトロン株式会社

C23C14/35

JP8165569A
JP2012012633A
JP5287519A
JP9157839A
JP2008056975A
JP60197869A
JP2006037209A
JP2013253316A

WO2011058812A1

Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka

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