FINE AIRTIGHT CONTAINER AND ITS MANUFACTURE

Title:

FINE AIRTIGHT CONTAINER AND ITS MANUFACTURE

Document Type and Number:

Japanese Patent JP2000124469

Kind Code:

A

Abstract:

To obtain a manufacturing method of a fine airtight container which can realize high vacuum degree.

A polycrystalline silicon film 21 which becomes a sealing member is formed by using SiH4 gas. Since the gas is active, it reacts on H2O. After the polycrystalline silicon film 21 is formed, the gas remaining in a space part 15 and H2O remaining in the space part 15 are made to react. According to this reaction, H2 gas and nonvolatile SiO2 are generated. A polycrystalline silicon film has a property to allow H2 gas to pass through at a high temperature. Accordingly, H2 gas inside the space part 15 is emitted to an outside through the polycrystalline silicon films 11, 12 by heating the polycrystalline silicon film 21 under high vacuum. As a result, high vacuum of the space part 15 can be realized.

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Inventors:

SAKATA JIRO
KAGEYAMA YASUYUKI
TSUCHIYA TOMOYOSHI
FUNABASHI HIROBUMI

Application Number:

JP30635998A

Publication Date:

April 28, 2000

Filing Date:

October 13, 1998

Export Citation:

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Assignee:

TOYOTA CENTRAL RES & DEV

International Classes:

H01L21/306; B62D57/00; B81B1/00; B81C3/00; H01L29/84; (IPC1-7): H01L29/84; B62D57/00; H01L21/306

Attorney, Agent or Firm:

Fuse Yukio (2 outside)

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