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Title:
FLUORENE-BASED COMPOUND
Document Type and Number:
Japanese Patent JP2008162925
Kind Code:
A
Abstract:

To obtain a new fluorene-based compound for forming a low-molecular film useful as a resist.

The fluorene-based compound is represented by general formula (1) (wherein, R is a hydrogen atom or a halogen atom; and the halogen atom is, for example, fluorine). The fluorene-based compound is dissolved in a solvent such as cyclohexane, etc., to prepare a solution, which is applied to a substrate to form a thin film. The thin film is a molecular assembly in which the fluorene-based compound is arranged by intermolecular force.


Inventors:
SON GUN
MATAGI HIROYUKI
Application Number:
JP2006352940A
Publication Date:
July 17, 2008
Filing Date:
December 27, 2006
Export Citation:
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Assignee:
KRI INC
International Classes:
C07C225/22; B05D7/24; C07C221/00; G03F7/004
Domestic Patent References:
JP2006064890A2006-03-09
JP2003277616A2003-10-02
JPH0651519A1994-02-25
JPH06167811A1994-06-14
Attorney, Agent or Firm:
Tsunehiko Ichikawa



 
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