FLUORINE-CONTAINING POLYMERIZABLE COMPOUND, METHOD FOR PRODUCING THE SAME, POLYMERIC COMPOUND OBTAINED FROM THE SAME, RESIST MATERIAL AND METHOD FOR FORMING PATTERN BY USING THE SAME

Japanese Patent JP2006124314

A

To provide a resist material suitable for a fine processing technology and a method for forming patterns.

This fluorine-containing compound is expressed by formula (1) [wherein, R1, R2 are each H or a 1-20C straight chain, branched chain or cyclic alkyl, or fluorinated alkyl; and R is H or a protective group]. The resist material obtained by using the polymeric material has a characteristic of having an excellent resolution, a small line edge roughness, excellent etching resistance and especially having small surface roughness after the etching in an ArF exposure. The fluorine-containing polymerizable ester compound is useful as a raw material of a polymeric compound, a functional material, a medicine and an agrochemical. Especially since it has an excellent transparency towards radiation having ≤500 nm, especially ≤200 nm wave length and also a phenolic acidic hydroxy group, it is very useful as a polymerizable monomer for producing a radiation sensitive resist having a good developmental characteristic.

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HARADA YUJI
HATAKEYAMA JUN
WATANABE TAKESHI
KANOU TAKESHI

JP2004313903A

May 18, 2006

October 28, 2004

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SHINETSU CHEMICAL CO

C07D309/10; C08F20/28; G03F7/033; G03F7/039; H01L21/027

Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa

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