Title:
GAS BARRIER LAMINATE AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2016087814
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a gas barrier laminate capable of maintaining adhesion of a silicon oxide film against an OPP film base material, even in a boil/retort treatment, and a manufacturing method therefor.SOLUTION: A gas barrier laminate 10 includes a biaxially stretched polypropylene film base material 1 and a silicon oxide film 2 formed at least on one side of the base material 1. In the biaxially stretched polypropylene film, a plane orientation coefficient ΔP measured by a phase-difference measurement method is within a range from 0.005 to 0.020, and an orientation angle is within a range from 50 to 90°, or from -50 to -90° in a MD direction. A manufacturing method of the gas barrier laminate is also provided.SELECTED DRAWING: Figure 1
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Inventors:
ISHII TOSHIYA
Application Number:
JP2014221307A
Publication Date:
May 23, 2016
Filing Date:
October 30, 2014
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
B32B9/00; B32B27/32
Domestic Patent References:
| JP2006327202A | 2006-12-07 | |||
| JPH1034846A | 1998-02-10 | |||
| JP2005047023A | 2005-02-24 | |||
| JP2009184252A | 2009-08-20 | |||
| JP2002144503A | 2002-05-21 |
Foreign References:
| WO2014157652A1 | 2014-10-02 |