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Patent Searching and Data


Title:
GATE VALVE AND SUBSTRATE PROCESSING SYSTEM USING SAME
Document Type and Number:
Japanese Patent JP2013011289
Kind Code:
A
Abstract:

To provide a gate valve capable of shortening distance of ascending and descending a valve body even though the number of a processed object processing at a time is increased.

The gate valve includes the valve body 63 which is pressed to a plurality of openings 61a-61d through which the processed objects are loaded and unloaded, a pressed portion 67 provided to the valve body 63, a main slider 70 which slides in parallel with respect to opening surface of the openings 61a-61d and a cam 71 which is provided on the main slider 70 and includes a protrusion 72 and an inclined portion 73 inclined from the protrusion 72 in sloped shape and presses the pressed portion 67 of the valve body 63 in such a condition as to face the valve body 63 to the openings 61a-61d. The valve body 63 has at least one of slit-like openings 65a-65c which functions as opening portions opening the openings 61a-61d and the gate valve configures portions adjacent to the slit-like openings 65a-65c as blocking portions 66a-66d blocking the openings 61a-61d.


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Inventors:
TATSUSHITA KOICHI
Application Number:
JP2011143129A
Publication Date:
January 17, 2013
Filing Date:
June 28, 2011
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
F16K3/18; F16K51/02; H01L21/677
Attorney, Agent or Firm:
Hiroshi Takayama