THERMAL TREATMENT DEVICE

Japanese Patent JP2023027614

A

To provide a thermal treatment device capable of preventing excessive rise in temperature of LED lamps.SOLUTION: A semiconductor wafer W is held by a susceptor 74, in a chamber 6. An upper chamber window 63 is attached at an upper part of the chamber 6, while a lower chamber window 64 is attached to a lower part of the same. A plurality of LED lamps 45 are arranged below the chamber 6. A filter 90 is provided between the semiconductor wafer W held by the susceptor 74 and the plurality of LED lamps 45. The filter 90 is a water filter, containing water existing therein. The filter 90 blocks or attenuates radiant light (infrared light) emitted from the semiconductor wafer W while transmitting light (visible light) output from the plurality of LED lamps 45. This prevents the radiant light from the semiconductor wafer W from reaching the LED lamps 45 to prevent excessive rise in temperature of the LED lamps 45.SELECTED DRAWING: Figure 8

JP2000516038	INDUSTRIAL APPLICABILITY Short-time annealing system and method thereof including improved temperature sensing and monitoring.
JP2001332507	SUBSTRATE PROCESSING DEVICE, METHOD OF HEATING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
JPH0758189	MODIFYING DEVICE

KAWARAZAKI HIKARU

JP2021132832A

March 02, 2023

August 17, 2021

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SCREEN HOLDINGS CO LTD

H01L21/26; H01L21/265

Hidetoshi Yoshitake
Takahiro Arita

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