To provide a high frequency plasma generating apparatus which has simple constitution and generates uniform electric field distribution between electrodes.
The high frequency plasma generating apparatus includes a pair of electrodes comprising a non-grounding electrode and a grounding electrode, a plurality of feeding points provided on the non-grounding electrode, and a power supply means for supplying the high frequency power to the non-grounding electrode from the plurality of feeding points, and generates plasma in a plasma generating area held by the non-grounding electrode and the grounding electrode. In the high frequency plasma generating apparatus, the non-grounding electrode has a square shape, and the plurality of feeding points are provided on an end of the non-grounding electrode at the positions so as to be symmetric to each other with respect to a symmetric plane of the non-grounding electrode.
FUKAZAWA TORU
TSUDA MUTSUMI
TAKI MASAKAZU
YONEDA HISAFUMI
| JP2002012977A | 2002-01-15 | |||
| JP2006202638A | 2006-08-03 | |||
| JP2005285564A | 2005-10-13 |
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order
Kazuhiro Oyaku
Shunichi Ueda
Junichiro Yoshida
Next Patent: ELECTROFORMING MOLD AND METHOD OF PRODUCING THE SAME