PLASMA TREATING DEVICE, MATCHING BOX AND FEEDER

Title:

PLASMA TREATING DEVICE, MATCHING BOX AND FEEDER

Document Type and Number:

Japanese Patent JP3396879

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a plasma treating device high in power consuming efficiency, higher in the coating forming rate than the case of the conventional one and capable of forming coating of higher quality.
SOLUTION: The side wall of housing 21 composed of a conductor and housing a matching circuit lying between a high frequency power source 1 and a plasma exciting electrode 4 and obtaining the matching of the impedance between the high frequency power source 1 and plasma exciting electrode 4 and a feeder 3 feeding high frequency power from the high frequency power source 1 to the plasma exciting electrode 4 through the matching circuit is formed nonparallel to the feeder 3.

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Inventors:

You Nakano
Seongcheol Kim
Koichi Fukuda
Yasuhiko Kasama
Shoichi Ono
Tadahiro Ohmi

Application Number:

JP34585197A

Publication Date:

April 14, 2003

Filing Date:

November 30, 1997

Export Citation:

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Assignee:

Alps Electric Co., Ltd.
Tadahiro Ohmi

International Classes:

H05H1/46; C23C14/40; C23C16/50; C23C16/505; H01L21/205; H01L21/3065; H01L21/31; (IPC1-7): H05H1/46; C23C16/505; H01L21/205; H01L21/31

Domestic Patent References:

JP3204925A

Attorney, Agent or Firm:

Hisao Fukumori

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