Title:
結晶性材料を適用する方法
Document Type and Number:
Japanese Patent JP4786144
Kind Code:
B2
Abstract:
Methods for applying crystalline materials to a substrate by applying a cation solution (210) and an anion solution (230) and crystallizing (300) at least a portion of the reaction product of the cation solution and the anion solution. The application of at least one of the cation solution (210) or the anion solution (230) is actively controlled such that it is applied in a patternwise or blanketwise fashion.
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Inventors:
Gregory S. Harman
Benjamin Clark
Peter Maddylovich
James O'Neill
David Champion
Benjamin Clark
Peter Maddylovich
James O'Neill
David Champion
Application Number:
JP2004170871A
Publication Date:
October 05, 2011
Filing Date:
June 09, 2004
Export Citation:
Assignee:
Hewlett-Packard Development Company
International Classes:
B05D1/26; B05C5/00; C01B13/36; C01B33/20; C01G25/02; C01G45/02; C30B7/00; C30B29/16; C30B29/34; H01L21/368
Other References:
SANGMOON PARK,LOW-TEMPERATURE THIN-FILM DEPOSITION AND CRYSTALLIZATION,MATERIALS SCIENCE,米国,AMERICAN ASSOCIATION FOR ADVANCEMENT OF SCIENCE,2002年,VOL 297,NO5578,P65
Attorney, Agent or Firm:
Satoshi Furuya
Takahiko Mizobe
Kiyoharu Nishiyama
Takahiko Mizobe
Kiyoharu Nishiyama