IMPROVED CLEANING OF PLASMA CHAMBER WALLS BY ADDING OF NOBLE GAS CLEANING STEP

Title:

IMPROVED CLEANING OF PLASMA CHAMBER WALLS BY ADDING OF NOBLE GAS CLEANING STEP

Document Type and Number:

Japanese Patent JP2009065170

Kind Code:

A

Abstract:

To provide an improved reaction chamber cleaning process which is readily applicable, may be combined with standard cleaning procedure, and is able to remove water residues by making use of noble-gas plasma reactions.

A noble-gas plasma (e.g. He) that emits high-energy EUV photons (E20 eV) which is able to destruct water molecules forming electronically excited oxygen atoms is used to remove the adsorbed water. The method includes emitting extreme-ultraviolet and/or vacuum-ultraviolet photons, having energy sufficiently high to initiate photodegradation of water molecules absorbed in a material, exposing the surface to the noble-gas plasma capable of emitting radicals of oxygen, hydrogen, and/or hydroxyl groups, and removing the radicals from the reaction chamber.

More Like This:

JPS6151829	MEMBER PROVIDED BY ETCHING, AND ETCHING METHOD THEREFOR
WO/2009/001774	METHOD FOR PROTECTING SEMICONDUCTOR WAFER AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE
JP2004517470	Method of removing etching residue generated in the via forming process

Inventors:

URBANOWICZ ADAM MICHAL
BAKLANOV MIKHAIL
SHAMIRYAN DENIS
DE GENDT STEFAN

Application Number:

JP2008229936A

Publication Date:

March 26, 2009

Filing Date:

September 08, 2008

Export Citation:

Click for automatic bibliography generation Help

Assignee:

IMEC INTER UNI MICRO ELECTR
UNIV LEUVEN KATH

International Classes:

H01L21/3065; H01L21/304

Domestic Patent References:

JPH11286023A	1999-10-19
JP2002228356A	2002-08-14
JPH11336662A	1999-12-07
JP2006508535A	2006-03-09
JPH1098019A	1998-04-14
JP2001351867A	2001-12-21
JP2007101024A	2007-04-19
JP2009065125A	2009-03-26

Foreign References:

US20050133059A1	2005-06-23
WO2006015072A2	2006-02-09
US20020074014A1	2002-06-20

Attorney, Agent or Firm:

Takuji Yamada
Mitsuo Tanaka

Previous Patent: PRINT OBJECT PROCESSING MACHINE, AND METHOD IN PRINT OBJECT PROCESSING MACHINE

Next Patent: FILM FORMING METHOD USING CVD DEVICE