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Title:
INSULATING METALLIC FOIL BAND FOR AMORPHOUS SILICON SOLAR CELL SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2001298204
Kind Code:
A
Abstract:

To provide an insulating metallic foil band for a solar cell substrate formed with a highly insulating film which can exhibit a photoelectric conversion efficiency higher than a texture effect, can control a film thickness with a high accuracy with a very small amount of paint, and can be free of defects such as pinholes, and also to provide a method for manufacturing the band.

In the insulating metallic foil band for an amorphous silicon solar cell substrate, an insulating film is formed on one surfaces of themetallic foil band having a thickness of 10-20 μm with use of paint which contains polyether sulfone resin as its main component and 5-40 volume % of pigment having an average grain size of 3-30 nm with respect to solids. The polyether sulfone resin paint may be coated with use of a plate cylinder roll having a spiral plate groove and a uniform plate groove density in a roll longitudinal direction and with use of a roll coater of a gravure or offset type, and then baked to form an insulating film having a thickness of 1-20 μm. In this case, a metallic foil band before being coated with the paint may be degreased with an organic solvent or an alkaline solution or be cleaned with acid. Further, after being degreased or cleaned with acid, the band may be subjected to coating type chromate treatment.


Inventors:
KAJIMOTO ATSUSHI
MAKINO TOMONORI
ANAMI KATSUMASA
Application Number:
JP2000114808A
Publication Date:
October 26, 2001
Filing Date:
April 17, 2000
Export Citation:
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Assignee:
NISSHIN STEEL CO LTD
International Classes:
C23C26/00; H01L31/04; (IPC1-7): H01L31/04; C23C26/00