To provide an interference exposure device and an interference exposure method which prevent the influence of stray light and can obtain uniform interference fringes on an exposure substrate.
The interference exposure device includes: light-shielding opening plates 18A and 18B having openings for shielding edges of light fluxes having been emitted from spatial filters 17A and 17B; and an exposure mask 19 which is adjacently arranged on an exposure substrate and masks edges of an interference exposure region formed by the light fluxes having been emitted from the openings. The light-shielding opening plates 18A and 18B reduce unnecessary stray light to the interference exposure region and the exposure mask 19 removes the influence of diffraction fluctuation of the edges of the exposure region due to opening ends of the light-shielding opening plates 18A and 18B, and accordingly uniform interference fringes on the exposure substrate can be obtained.
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Seiji Iga
Toshiya Fujii
Nobuhiro Noguchi
Yusei Atsuya
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