Title:
ナノサイズ形状の大面積パターニング
Document Type and Number:
Japanese Patent JP5723779
Kind Code:
B2
Abstract:
Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
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Inventors:
Sligny Vassan, Citrgata Vui
Yang, Shukian
Shu, Frank Wye
La Blake, De Wein El
Yang, Shukian
Shu, Frank Wye
La Blake, De Wein El
Application Number:
JP2011536331A
Publication Date:
May 27, 2015
Filing Date:
November 13, 2009
Export Citation:
Assignee:
Molecular Imprints Incorporated
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
International Classes:
H01L21/027; B29C33/38; B29C33/42; B29C59/02
Domestic Patent References:
| JP2006504519A | ||||
| JP2009512576A | ||||
| JP2007069604A | ||||
| JP2006159899A | ||||
| JP2009107128A | ||||
| JP2005150333A | ||||
| JP2003017474A | ||||
| JP2009503139A | ||||
| JP2008517448A | ||||
| JP2008545252A |
Foreign References:
| WO2008047447A1 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa