To provide a manufacturing apparatus for a liquid crystal device, the apparatus capable of contributing to reduction of the proprietary area.
The liquid crystal device has a liquid crystal layer held between a pair of substrates facing each other and has an inorganic alignment layer formed on the inner surface side of at least one of the substrates. The manufacturing apparatus is equipped with a film forming chamber 2 and a sputtering device 3 to form an inorganic alignment layer by forming a film of an alignment layer material on a substrate W by a sputtering method in the film forming chamber. The sputtering device includes a pair of targets 5a, 5b facing each other through a plasma generation region, and an opening 3a where sputtered particles are emitted from the plasma generation region in approximately a vertical direction. The film forming chamber is provided with a moving device 6, 6a that supports the substrate W while tilting the surface where the inorganic alignment layer is to be formed, with respect to a horizontal plane, and moves the substrate in a direction as a scanning direction intersecting the vertical direction.
Masatake Shiga
Masakazu Aoyama
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