Title:
MASK HAVING PATTERN FOR DETECTING UNEQUAL ILLUMINANCE
Document Type and Number:
Japanese Patent JP2723081
Kind Code:
B2
Abstract:
PURPOSE: To improve the nondefective article rate of products by observing the unequal luminance which contingently occurs during scan exposure.
CONSTITUTION: This mask is used in the case where the patterns on the mask of the area wider than a slit-like illumination region onto a photosensitive substrate by scanning the mask formed with the patterns and the photosensitive substrate. The mask is provided with a pattern region 3 for detecting unequal illuminance having a width of 10μm along the scan direction of the mask 1 for scan exposure. This pattern region 3 for detecting unequal illuminance exists at the end of the mask so as not to hinder the arrangement of main patterns.
Inventors:
HASHIMOTO SHUICHI
Application Number:
JP13989395A
Publication Date:
March 09, 1998
Filing Date:
May 15, 1995
Export Citation:
Assignee:
NIPPON DENKI KK
International Classes:
G03F1/44; G03F7/20; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP58193545A | ||||
| JP2308518A | ||||
| JP6120117A | ||||
| JP5834731U |
Attorney, Agent or Firm:
Soro Koro
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