To efficiently and accurately measure optical characteristics of a projection optical system without upsizing an optical system for measurement.
In a measurement apparatus for measuring the optical characteristics of a projection optical system PL, the measurement apparatus includes a reticle mark plate RFM formed with phase marks 20 disposed at a plurality of measurement points P(i, j) on an object face, a fluorescence screen 35 formed with a periodic pattern 39 disposed at a position on an image face corresponding to the measurement point P(i, j), an FOP 37 for guiding a detection light DL created by an illuminating light IL which has passed the phase mark 20, the projection optical system PL, and the periodic pattern 39 to a detection face, and an image sensor 38 for detecting the detection light DL.
INOUE JIRO
NAGAYOSHI HIROYUKI
KOSUGI JUNICHI
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