To efficiently and accurately measure information on a surface shape of a mask without enlargement of an optical system for measurement.

A measuring device for measuring shape information of a reticle includes a reticle R that is disposed at an object surface side of a projection optical system PL and includes a pattern surface on which a plurality of phase marks 20 are formed, a fluorescent film 35 that is disposed at an image surface side of the projection optical system PL and has a plurality of periodic patterns 39 formed corresponding to the phase marks 20, an FOP 37 and an image sensor 38 for detecting detection light DL generated from illumination light IL passing through the phase mark 20, the projection optical system PL, and the periodic pattern 39, and an arithmetic unit for obtaining the shape information of the pattern surface from the detection signal of the image sensor 38.