To provide a simple method of manufacturing a color filter for a semi-transmissive liquid crystal display device causing neither void nor color unevenness without causing fall-out of RGB even if RGB film thickness on a transparent film is set to be thin by forming a transparent layer beforehand in a light transmission area in one pixel, and then using the same photosensitive colored resin composition to form a colored layer with an appropriate thickness for a transmission type in a light transmission area and a colored layer with an appropriate thickness for a reflection type in a light reflecting area.
The transparent layer is formed in the light reflecting area first, and then the photosensitive colored resin composition is applied to the whole transparent substrate surface with a thickness to form the colored layer with the thickness for the transmission type and dried. A photomask designed to be smaller than the transparent layer to expose in halftone to drop an exposure amount and luminous intensity at the center part of the reflecting area and to expose not in halftone but normally at an edge part of the transparent layer and in the transmission area, is used to perform exposure and development.
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TADA MASAHIRO
MASUDA ICHIRO
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