To detect abnormality of a substrate manufacturing apparatus in an idle mode to prevent the reduction in yield.

A substrate manufacturing apparatus monitoring system 10 comprises a data collection unit 12, a data storage unit 14, a control state judgement unit 15, and a data judgement unit 13. The data collection unit 12 collects control parameter data from a substrate manufacturing apparatus 1 including incidental equipment 6. The control parameter data collected by the data collection unit 12 is stored in the data storage unit 14. The control state judgement unit 15 judges a control state of the substrate manufacturing apparatus on the basis of the data in the data storage unit 14. The data judgement unit 13 judges each judged control state to be abnormal/normal. Since abnormality of the apparatus can be detected even in the idle mode before substrate processing, the reduction in product yield can be prevented.