NEGATIVE TYPE RESIST COMPOSITION

Japanese Patent JP3502469

B2

PURPOSE: To provide the negative type resist composition, which can form a resist pattern having high resolution, excellent residual film ratio and the good cross section shape by composing the resist composition of polyhydroxystylene, cross linking agent and tris (2,3-dibromopropyl) isocyannulate.
CONSTITUTION: This negative type resist composition contains polyhydroxystylene (A), cross linking agent (B) and tris (2,3-dibromopropyl) isocyannulate. The composition (A) is made of single polyhydroxystylene (a), single polyhydroxystylene, of which hydroxyl group at 1-45% by mole is replaced with tert-butoxycarbonyloxy group (b), or the mixture of polyhydroxystylene (c). The weight mean molecular weight of this resin exists in a range at 5000-30000 measured by gel permeation chromatography, and desirably in a range at 10000-25000.

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Akiyoshi Yamazaki
Kiyoshi Ishikawa
Katsumi Ohmori
Mitsuru Sato
Toshimasa Nakayama

JP4792695A

March 02, 2004

February 14, 1995

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Tokyo Ohka Kogyo Co., Ltd.

G03F7/004; G03F7/038; H01L21/027; (IPC1-7): G03F7/038; G03F7/004; H01L21/027

JP545879A
JP387748A
JP534903A
JP5181277A
JP683055A
JP5181265A
JP5313371A
JP7146556A

Heihachi Hattori

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