Title:
新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5368270
Kind Code:
B2
Abstract:
There is disclosed a sulfonate shown by the following general formula (2). R1—COOC(CF3)2—CH2SO3−M+ (2) (In the formula, R1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M+ represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.
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Inventors:
Masaki Ohashi
Tsuyoshi Kanao
Yoichi Osawa
Tsuyoshi Kanao
Yoichi Osawa
Application Number:
JP2009262560A
Publication Date:
December 18, 2013
Filing Date:
November 18, 2009
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07C309/08; C07C25/02; C07C303/02; C07C303/32; C07C309/12; C07C381/12; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2008007410A | ||||
| JP2008297255A | ||||
| JP2008133262A | ||||
| JP2001133984A | ||||
| JP2009299069A |
Attorney, Agent or Firm:
Mikio Yoshimiya