PURPOSE: To provide the particle detecting method of a vacuum device which can efficiently measure particles in a vacuum processing chamber with high accuracy and high reproducibility by using a particle detecting means inserted into an exhaust line.
CONSTITUTION: A gas is introduced into a vacuum processing chamber 1 toward a lower electrode 3 from a plurality of blowout nozzles of a blowing-off means which is in contact with an upper electrode 2 until the gas pressure in the chamber 1 becomes higher than the gas pressure used at the time of processing wafers. Then the gas pressure is maintained at the same level or lowered to a fundamental pressure. When the gas pressure is lowered, particles generated in the chamber 1 are detected by means of a particle detecting means 9 inserted into an exhaust line 10.
YAMAGUCHI MASANORI
KAMIYA SEISAKU
SATO SHINTARO
UCHIYAMA TAKAHIRO
Next Patent: PARTICLE DETECTING METHOD