パターン合わせずれ計測方法およびプログラム

Title:

パターン合わせずれ計測方法およびプログラム

Document Type and Number:

Japanese Patent JP4950550

Kind Code:

B2

Abstract:

A pattern misalignment measurement method includes acquiring an inspection image of a composite pattern formed by superposing a plurality of kinds of element patterns on each other, acquiring reference images of at least two kinds of element patterns from reference images which are images of reference patterns of the plurality of kinds of element patterns, performing first matching of each of the acquired reference images with the inspection image, and outputting misalignment between the element patterns in the composite pattern on the basis of the result of the first matching.

More Like This:

JPH10339956	RESIST DEVELOPING METHOD FOR WAFER
JP2005158843	METHOD OF ADJUSTING UNIFORMITY IN ILLUMINATION IN CHARGED PARTICLE BEAM ILLUMINATION APPARATUS
JP5482192	Cleaning agent for silicon wafers

Inventors:

Tadashi Mitsui

Application Number:

JP2006117931A

Publication Date:

June 13, 2012

Filing Date:

April 21, 2006

Export Citation:

Click for automatic bibliography generation Help