Title:
PATTERN FORMING METHOD FOR NANOCARBON MATERIAL, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2005347378
Kind Code:
A
Abstract:
To provide a pattern forming method for a nanocarbon material for manufacturing a device utilizing the nanocarbon material, such as field effect transistor and FED (field-emission display).
A pattern of the nanocarbon material is formed by the method at least incluindg the processes of forming a nanocarbon material layer on a board, forming a desired pattern of a first metal layer on the nanocarbon material layer, the metal layer being made of a metal selected from a group at least including zinc, tin, indium, aluminum, and titanium, and etching the nanocarbon material layer by irradiating it with an oxygen plasma via the first metal layer pattern as a mask of a positive pattern.
Inventors:
KAWAKAMI SOICHIRO
Application Number:
JP2004162966A
Publication Date:
December 15, 2005
Filing Date:
June 01, 2004
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/3065; H01L21/3205; H01L21/3213; H01L21/336; H01L23/52; H01L29/06; H01L29/786; (IPC1-7): H01L21/3065; H01L21/3205; H01L21/3213; H01L21/336; H01L29/06; H01L29/786
Attorney, Agent or Firm:
Keisuke Watanabe
Yoshihiro Yamaguchi
Yoshihiro Yamaguchi