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Title:
PHOTOCURABLE RESIN COMPOSITION AND ARTICLE HAVING CURED COATING
Document Type and Number:
Japanese Patent JP2010189620
Kind Code:
A
Abstract:

To provide a photocurable resin composition, with which cured coating having good storage stability, high transparency, good scratch resistance, and good antistatic property can be produced and to provide an article having the cured coating.

The photocurable resin composition comprises (1) inorganic oxide fine particles having an average particle size of 80 nm or less, (2) a compound containing 3 or more (meth)acrylic groups, (3) a compound containing 1 or 2 (meth)acrylic groups, (4) aliphatic amine-based ionic compound, and (5) a radical photopolymerization initiator, wherein the component (1) ranges from 25 to 70 pts.mass, the component (2) ranges from 20 to 70 pts.mass, and the component (3) ranges from 5 to 30 pts.mass based on a total of 100 pts.mass of the (1), (2), and (3) components, the component (4) ranges from 0.05 to 3 pts.mass and the component (5) ranges from 1 to 8 pts.mass with respect to the total of 100 pts.mass of the components (1), (2), and (3), substantially no solvent is contained, and the viscosity at 25°C is 500 mPa s or less.


Inventors:
YOSHIKAWA YUJI
Application Number:
JP2009248989A
Publication Date:
September 02, 2010
Filing Date:
October 29, 2009
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
C08F2/44; C08F220/20
Domestic Patent References:
JP2009102628A2009-05-14
JP2003306561A2003-10-31
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa