Title:
PHOTOMASK FOR PROXIMITY EXPOSURE, EXPOSURE METHOD AND EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2008197234
Kind Code:
A
Abstract:
To provide a photomask for proximity exposure capable of suppressing the sticking of sublimated material originated from a resist.
The photomask for proximity exposure has a pattern made of light shielding material formed on a light-transmissive substrate, wherein a coated film made of a photocatalyst which exhibits photocatalyst action by the exposure light or a coated film including the photocatalyst is formed on the surface on which the pattern is formed.
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Inventors:
YUGUCHI SATORU
Application Number:
JP2007030486A
Publication Date:
August 28, 2008
Filing Date:
February 09, 2007
Export Citation:
Assignee:
NSK LTD
International Classes:
G03F1/48; G03F7/20
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Hironori Honda
Toshimitsu Ichikawa