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Patent Searching and Data


Title:
PHOTOPOLYMERIZABLE COMPOSITION
Document Type and Number:
Japanese Patent JP2000284479
Kind Code:
A
Abstract:

To obtain a photopolymerizable composition having high sensitivity even to light in the UV region of >1,000 nm.

The photopolymerizable composition contains (A) an ethylenic unsaturated compound, (B-1) an N,N-diaryliminium cation which is asymmetric in one of molecular minor and major axes in the chemical structural formula and (B-2) an organic boron anion, or (B) the salt of an N,N-diaryliminium cation which is asymmetric in one of molecular minor and major axes in the chemical structural formula and a counter anion other than an organic boron anion, and (C) a photopolymerization initiator.


Inventors:
TAKASAKI RYUICHIRO
URANO TOSHIYOSHI
Application Number:
JP9451299A
Publication Date:
October 13, 2000
Filing Date:
April 01, 1999
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP
International Classes:
G03F7/029; C08F2/50; C08F290/12; C09D5/00; (IPC1-7): G03F7/029; C08F2/50; C09D5/00
Attorney, Agent or Firm:
Hasegawa Moji