Title:
PLASMA DEVICE
Document Type and Number:
Japanese Patent JP3067579
Kind Code:
B2
Abstract:
PURPOSE: To make it possible to perform a plasma treatment on a large-area substrate stably and uniformly by a method wherein microwave introducing plates are supported by a support body and hollow parts formed in the support body are formed into a slit shape.
CONSTITUTION: Microwave introducing ports 3 are opened in the upper part of a reaction container 1 and a support body 5 fixed with microwave introducing plates 4 is fixed on the upper walls, which encircle these microwave introducing ports 3, of the container 1 in such a way that O-rings 11 are sandwiched between the support body 5 and the upper walls. The plates 4 are also fixed on the support body 5 in such a way that O-rings 7 are hold between the plates 4 and the body 5. The support body 5 consists of an annular quadrilateral outer frame 5a to correspond to the form of the upper walls of the container 1, a central cross-shaped beam 5b to divide the region of the support body 5 into quarters and a beam 5c, in which slit-shaped hollow parts 6 are formed. Here, each short-side of the slit-shaped hollow parts 6, which are opened in the body 7, is set in a length of 1/6 (20mm) or longer of the wavelength of a microwave to the wavelength or shorter of the microwave and the hollow parts 6 are arranged at intervals of the wavelength of shorter of the microwave.
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Inventors:
Takahiro Yoshiki
Kyoichi Komachi
Kyoichi Komachi
Application Number:
JP7107095A
Publication Date:
July 17, 2000
Filing Date:
March 29, 1995
Export Citation:
Assignee:
SUMITOMO METAL INDUSTRIES,LTD.
International Classes:
H05H1/46; C23C16/50; C23C16/511; C23F4/00; G02F1/1333; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): H01L21/3065; C23C16/50; C23F4/00; G02F1/1333; H01L21/205; H05H1/46
Domestic Patent References:
| JP8255785A | ||||
| JP7335393A | ||||
| JP83770A | ||||
| JP63293824A | ||||
| JP6104098A |
Attorney, Agent or Firm:
Morio Mori (1 outside)