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Title:
PLASMA LIGHT SOURCE
Document Type and Number:
Japanese Patent JP2014056650
Kind Code:
A
Abstract:

To provide a plasma light source which can ideally supply a medium substance of plasma radiating extreme ultraviolet light.

The plasma light source includes: a pair of coaxial electrodes 10, 10 placed opposite to each other; a laser device 50 which, during cyclic irradiation of laser beam for generating plasma, irradiates each of the coaxial electrodes 10 with laser beam having wavelength different from that of the laser beam for generating plasma; a surface state evaluation part 60 which evaluates a surface state of a distal end part of a center electrode 12 in the coaxial electrodes 10 according to scattered light 52a of the laser beam; and a supply amount adjustment part 70 for adjusting a supply amount of a medium substance for plasma from the plasma medium supply part formed at the distal end part on the basis of an evaluation result of the surface state of the distal end part by the surface state evaluation part 60.


Inventors:
KUWABARA HAJIME
Application Number:
JP2012199219A
Publication Date:
March 27, 2014
Filing Date:
September 11, 2012
Export Citation:
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Assignee:
IHI CORP
International Classes:
H05G2/00; H01L21/027; H05G1/44
Domestic Patent References:
JP2001326096A2001-11-22
JP2010147231A2010-07-01
JP2011222387A2011-11-04
Foreign References:
WO2010071036A12010-06-24
Attorney, Agent or Firm:
Hidekazu Miyoshi
Iwa Saki Kokuni
Shunichi Takahashi
Masakazu Ito
Toshio Takamatsu



 
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