Title:
PLASMA PROCESSING APPARATUS AND METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
Japanese Patent JP2015111543
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus and method which allow for high speed processing and stable utilization, and to provide a method of manufacturing an electronic device.SOLUTION: In an induction coupling plasma torch unit T, a coil 3, a first ceramic block 4 and a second ceramic block 5 are arranged in parallel, and a long chamber 7 is annular. A plasma P generated in a chamber 7 is ejected from the opening 8 in the chamber 7 toward a substrate 2. The substrate 2 is processed by moving the long chamber 7 and a substrate mounting base 1 relatively, in a direction perpendicular to the longitudinal direction of the opening 8. A long plasma can be created stably by introducing discharge suppression gas, through a discharge suppression gas supply hole 13, into a space between the induction coupling plasma torch unit T and the substrate 2 on the inside of the chamber 7.
Inventors:
OKUMURA TOMOHIRO
Application Number:
JP2014098348A
Publication Date:
June 18, 2015
Filing Date:
May 12, 2014
Export Citation:
Assignee:
PANASONIC IP MAN CORP
International Classes:
H05H1/30; C23C16/505; H01L21/20; H01L21/205; H01L21/265; H01L21/31; H01L21/316; H01L21/324; H05H1/24
Domestic Patent References:
| JP2010129198A | 2010-06-10 | |||
| JP2001259412A | 2001-09-25 | |||
| JPH10130851A | 1998-05-19 | |||
| JP2013120633A | 2013-06-17 | |||
| JP2013093264A | 2013-05-16 | |||
| JP2013020836A | 2013-01-31 | |||
| JP2001093871A | 2001-04-06 | |||
| JPH10294307A | 1998-11-04 | |||
| JP2010129198A | 2010-06-10 | |||
| JP2001259412A | 2001-09-25 | |||
| JPH10130851A | 1998-05-19 |
Foreign References:
| WO2012101891A1 | 2012-08-02 | |||
| WO2012101891A1 | 2012-08-02 |
Attorney, Agent or Firm:
Kentaro Fujii
Kenji Kamada
Hiroo Maeda
Kenji Kamada
Hiroo Maeda