Title:
POLYMER COMPOSITION, AND PHOTORESIST COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2013010956
Kind Code:
A
Abstract:
To provide a photoresist polymers having improved (i.e., decreased) linewidth roughness for EUV applications.
The polymer comprises the polymerized product of monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, and a photoacid-generating monomer; a chain transfer agent of the formula, wherein Z is a y-valent C1-20 organic group, x is 0 or 1, Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl; and optionally, an initiator.
Inventors:
KRAMER JOHN W
Application Number:
JP2012140619A
Publication Date:
January 17, 2013
Filing Date:
June 22, 2012
Export Citation:
Assignee:
DOW GLOBAL TECHNOLOGIES LLC
International Classes:
C08F220/18; G03F7/004; G03F7/039; G03F7/26
Domestic Patent References:
| JP2008195868A | 2008-08-28 | |||
| JP2010095643A | 2010-04-30 | |||
| JP2007246588A | 2007-09-27 | |||
| JP2008239889A | 2008-10-09 | |||
| JP2008195868A | 2008-08-28 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office
Previous Patent: FLAME-RETARDANT RESIN COMPOSITION AND METAL-CLAD LAMINATE FOR FLEXIBLE PRINTED-WIRING BOARD, COVER L...
Next Patent: GASKET
Next Patent: GASKET