Title:
POSITION DETECTOR
Document Type and Number:
Japanese Patent JP3303280
Kind Code:
B2
Abstract:
PURPOSE: To accurately detect the focus position on the exposed surface of a moving wafer and to feed the focus position thus detected to a servo system in a step and scan system aligner.
CONSTITUTION: A measuring point PA2 on a wafer 15 within an exposed region 16 and a measuring point PB2 on this side in the scanning direction (X direction) are detected by means of AF sensors 25A2, 25B2. Focus signals SA2, SB2 from amplifiers 32A2, 32B2 are multiplied by weighting coefficients K1, K2 and added through an adder 37D2 to produce a reference focus signal SD2. The focus signal SD2 is fed to a wafer drive system 24 which adjusts three fulcrums 18A-18C.
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Inventors:
Takashi Miyachi
Application Number:
JP22870693A
Publication Date:
July 15, 2002
Filing Date:
September 14, 1993
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/207; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F7/207
Domestic Patent References:
| JP61251029A | ||||
| JP6283403A | ||||
| JP4350925A | ||||
| JP4277612A |
Attorney, Agent or Firm:
Satoshi Ohmori