Title:
POSITIVE RESIST MATERIAL
Document Type and Number:
Japanese Patent JP3812624
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a positive resist material having high sensitivity and high resolution and wide exposure latitude and process aptitude by incorporating a specified polymer.
SOLUTION: This positive resist material comprises the polymer having weight average molecular weight of 1,000-500,000 and repeating units represented mainly by the formula, in which R1 is an H atom or a methyl group; R2 is a group instable to acids; each of R3, R4, R6, and R7 is, independently an H atom or a 1-6C straight or branched alkyl group; R5 is a 1-10C straight or branched or cyclic alkylene or alkylene ether or cyclohexylene group or the like; R8 is an H atom or a 1-10C straight or branched or cyclic alkyl or vinyl or acetyl or phenyl group or the like; each of (p), (r), and (s) is an integer; (q) is 0 or an integer; z1 is an integer of 1-3; z2 is an integer of 0-3.
More Like This:
| WO/2022/045737 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION |
Inventors:
Takanobu Takeda
Osamu Watanabe
Jun Watanabe
Jun Hatakeyama
Yoichi Osawa
Toshinobu Ishihara
Osamu Watanabe
Jun Watanabe
Jun Hatakeyama
Yoichi Osawa
Toshinobu Ishihara
Application Number:
JP28935399A
Publication Date:
August 23, 2006
Filing Date:
October 12, 1999
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; H01L21/027; C08L25/18; C08L33/06; G03F7/004; (IPC1-7): G03F7/039; C08L25/18; C08L33/06; G03F7/004; H01L21/027
Domestic Patent References:
| JP10265524A | ||||
| JP11344808A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa