To obtain a positive type photosensitive composition having good profile and high sensitivity and resolution, hardly causing change in performance with the passage of time after exposing light and useful for synthesis of semiconductor of a litho printing plate, IC, etc., and production of circuit board for liquid crystals or thermal heads.
This composition contains a disulfonic acid salt compound of sulfonium or iodonium of formula I or II (R1 to R5 are each H, an alkyl, an alkoxy, hydroxy, a halogen or S-R6; R6 is an alkyl or an aryl; Ar is an aromatic hydrocarbon). The composition contains preferably a resin having a group decomposed by action of an acid and increasing solubility in an alkali developing solution and a compound of formula I or II capable of generating sulfonic acid by irradiation of active light or radiation. The compound of formula I or II is obtained by subjecting the corresponding Cl- salt (a compound obtained by substituting O3S-Ar-SO3- by Cl-) to salt exchange with a compound of the formula Y+-O3S-Ar-SO3-Y+ (Y+ is H+, Na+, K+, NH4+, N(CH3)4+, etc.) in an aqueous solution.
SATO KENICHIRO
KODAMA KUNIHIKO
