Title:
PROCESSES FOR PRODUCTION OF GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, TRANSFER MASK, SEMICONDUCTOR DEVICE, GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK AND TRANSFER MASK
Document Type and Number:
Japanese Patent JP3966840
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a glass substrate for a mask blank with no fine convex surface defects on a surface of the substrate and its production method; a mask blank using the substrate and its production method; a transfer mask and its production method; and a production method of a semiconductor device.
SOLUTION: In a process comprising subjecting the glass substrate to necessary processing, roughly polishing a surface thereof, and then conducting finish polishing thereof, a super-fine polishing step of polishing the surface using a polishing liquid (slurry) containing colloidal silica abrasive grains produced by hydrolysis of an organic silicon compound is provided in the finish polishing step.
More Like This:
| JP7061965 | Polishing composition |
| WO/2005/034226 | METAL POLISHING COMPOSITION |
Inventors:
Koike Konasahiro
Junji Miyagaki
Junji Miyagaki
Application Number:
JP2003294619A
Publication Date:
August 29, 2007
Filing Date:
August 18, 2003
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
B24B37/00; B24B37/005; B24B37/04; G03F1/24; G03F1/60; H01L21/027; (IPC1-7): B24B37/00; B24B37/04; G03F1/14; H01L21/027
Domestic Patent References:
| JP64040267A | ||||
| JP2001047358A | ||||
| JP61209910A | ||||
| JP2002131889A |
Attorney, Agent or Firm:
Aniya Setsuo
Toru Yui
Hitoshi Kiyono
Toru Yui
Hitoshi Kiyono
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