PROJECTION ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME

Title:

PROJECTION ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME

Document Type and Number:

Japanese Patent JPH05144700

Kind Code:

A

Abstract:

PURPOSE: To correct fluctuation of optical characteristics due to thermal change caused by the absorption of exposing light, and obtain a projection pattern image of high resolution.

CONSTITUTION: When a pattern on the surface of a first object 2 is projected on the surface of a second object 3 and exposed by a projection optical system, at least one tightly closed lens space is formed in the projection optical system by using lens surfaces. While the inside gas pressure of the space is kept nearly equal to the outside gas pressure, the space is filled with mixed gas having at least two kinds of gas different in refractive index. By controlling the mixing ratio of the mixed gas, optical characteristics of the projection optical system is controlled.

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Inventors:

ORII SEIJI
UNNO YASUYUKI
YONEKAWA MASAMI

Application Number:

JP33443791A

Publication Date:

June 11, 1993

Filing Date:

November 22, 1991

Export Citation:

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Assignee:

CANON KK

International Classes:

G03F7/20; G03F7/207; H01L21/027; H01L21/30; (IPC1-7): G03F7/20; G03F7/207; H01L21/027

Attorney, Agent or Firm:

Takanashi Yukio

Previous Patent: JPS5144699

Next Patent: PROJECTION ALIGNER AND FABRICATION OF SEMICONDUCTOR ELEMENT USING THE SAME