To provide a radiation-sensitive composition for forming light- scattering film which can give a light-scattering film, that scatters reflective light efficiently and materializes a surface illumination that is uniform and has a high front (axial) luminance in semipermeable and reflecting liquid crystal displays, is excellent in flattening properties, thermal resistance and chemical resistance, and is highly adherent to ITO films, and to provide a curable compo sition having radiation-sensitive properties which eliminate the scattering of an alignment mark section by light-exposure and development steps and make possible a correct registration.
The radiation-sensitive composition for forming light-scattering film comprises (A) a copolymer of (a1) at least one carboxylic acid compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides, (a2) an epoxidized unsaturated compound, and (a3) an olefinic unsaturated compound other than the foregoing compounds (a1) and (a2), (B) a light-scattering material, (C) a multi-functional monomer, and (D) a photopolymerization initiator.
TAKATORI MASASHIGE
ENDO MASAYUKI
| JPH06192389A | 1994-07-12 | |||
| JPH11160505A | 1999-06-18 |